发明名称 SEMICONDUCTOR STRUCTURE HAVING AN ELOG ON A THERMALLY AND ELECTRICALLY CONDUCTIVE MASK
摘要 <p>A semiconductor structure includes a substrate, a thermally and electrically conductive mask positioned upon the substrate, and an epitaxial lateral over growth (ELOG) material positioned upon the thermally and electrically conductive mask.</p>
申请公布号 WO2010071633(A1) 申请公布日期 2010.06.24
申请号 WO2008US86991 申请日期 2008.12.16
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;WANG, SHIH-YUAN;THYLEN, LARS, HELGE;MATHAI, SAGI, VARGHESE 发明人 WANG, SHIH-YUAN;THYLEN, LARS, HELGE;MATHAI, SAGI, VARGHESE
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址