发明名称 VACUUM PROCESSING APPARATUS AND VACUUM TRANSFER APPARATUS
摘要 <p>Transfer performance in a cluster tool is improved without expanding the space at the bottom of the platform in the perpendicular direction. Within a platform (PF), a first transfer robot (16L) has: a transfer body (48L) which can slidably move on a left side guide rail (46L); a transfer base (50L) which can slidably move in the offset direction (X direction); and a slider-type transfer arm (52L) which can turn within a horizontal plane, which can move straight in a direction parallel to the radius of the turn, and which can support one semiconductor wafer (W).  A second transfer robot (16R) also has the same configuration and functions as the first transfer robot (16L), however, the transferring/moving directions of the respective sections are opposite those of the first transfer robot (16L).</p>
申请公布号 WO2010070896(A1) 申请公布日期 2010.06.24
申请号 WO2009JP06919 申请日期 2009.12.16
申请人 TOKYO ELECTRON LIMITED;HIROKI, TSUTOMU 发明人 HIROKI, TSUTOMU
分类号 H01L21/677;B65G49/07 主分类号 H01L21/677
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