发明名称 METHOD FOR FORMING OPTICAL THIN FILM
摘要 <P>PROBLEM TO BE SOLVED: To drastically enhance control accuracy of optical film thickness, and to contribute to stabilize film forming speed and reduce cost by providing an optical film thickness meter alternative to a quartz film thickness meter. <P>SOLUTION: In an optical film thickness controller of an optical thin film forming apparatus for forming an optical thin film by dispersing film forming materials in a container and depositing the film forming materials on a substrate, the optical film thickness controller includes: a target optical film thickness estimation means for estimating target optical film thickness information, based on transmissivity estimated by a predetermined nonlinear model formula and an amount value of detected light of transmitted light or reflected light measured by an optical receiver to measuring light irradiated to a film to be formed; and an estimation control means for estimating an arrival time to the target optical film thickness information, to indicate an end of film formation when arrived at the arrival time. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010138463(A) 申请公布日期 2010.06.24
申请号 JP20080317385 申请日期 2008.12.12
申请人 K2 TECHNOLOGY KK 发明人 TAKAHASHI KEIJI
分类号 C23C14/54;G02B1/11;G02B5/28 主分类号 C23C14/54
代理机构 代理人
主权项
地址