发明名称 |
RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
摘要 |
A resist composition including a base resin component (A) and an acid-generator component (B) which generates acid upon exposure, the component (A) including a resin (A1) which has a structural unit (a0) represented by general formula (a-0) shown below: wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; a represents an integer of 0 to 2; b represents an integer of 1 to 3; c represents an integer of 1 to 2; and a+b is an integer of 2 or more.
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申请公布号 |
US2010159389(A1) |
申请公布日期 |
2010.06.24 |
申请号 |
US20060160742 |
申请日期 |
2006.12.26 |
申请人 |
TAKESHITA MASARU;IWASHITA JUN;IWAI TAKESHI;OHGOMORI YUJI |
发明人 |
TAKESHITA MASARU;IWASHITA JUN;IWAI TAKESHI;OHGOMORI YUJI |
分类号 |
G03F7/004;C08F224/00;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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