| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high sensitivity to radiation, capable of allowing formation of a spacer or a protective film free of peeling of a pattern in a developing process or a rubbing process and preventing image persistence when used for a liquid crystal display element, reducing coating unevenness in a slit coating system, and excellent in storage stability. <P>SOLUTION: The radiation-sensitive resin composition contains (A) an alkali-soluble resin, (B) a polymerizable unsaturated compound, and (C) a radiation-sensitive polymerization initiator, wherein the alkali-soluble resin (A) contains a copolymer prepared through a step of polymerizing monomers containing a polymerizable unsaturated carboxylic acid and/or a polymerizable unsaturated carboxylic acid anhydride in the presence of a compound expressed by formula (1). In formula (1), Z<SP>1</SP>and Z<SP>2</SP>each independently represents an alkyl group having 4 to 18 carbon atoms or a benzyl group which may have a substituent. <P>COPYRIGHT: (C)2010,JPO&INPIT |
