SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide the substrate processing apparatus which prevents ununiformity of films of substrates, caused by displacement between an auxiliary support plate made of SiC and a support plate made of Si. SOLUTION: The substrate processing apparatus is equipped with: a reactor which processes a substrate 7; a substrate holder 1 which holds the substrate 7 in the reactor; a ring-shaped support plate 4 provided in the substrate holder 1 and touching the substrate 7; and the auxiliary support plate 3 made of a material different from that of the support plate 4 and mounting the support plate 4, wherein a recess 39 is formed in the backside of the support plate 4 and a protrusion 38 to be fitted in the recess 39 is provided on the auxiliary support plate 3. COPYRIGHT: (C)2010,JPO&INPIT