| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam device capable of superbly carrying out the detection of a reflection electron or the detection of both the reflection electron and a secondary electron even in the electron beam device with an electron detection unit arranged above an objective lens. SOLUTION: The electron beam device is provided with an electron beam source 1 emitting electron beams 21 accelerated by a given accelerating voltage, an objective lens 6 for focusing the electron beams 21 emitted from the electron beam source 1 and irradiating the electron beams 21 on a sample 20, a scanning coil 5 for scanning the focused electron beams 21 over the sample 20, and an electron detection unit 7 arranged above the objective lens 6 with a hole formed for making the electron beams pass through. The electron detection unit 7 is provided with an electrode 9 for generating an electric field for drawing an electron 22 to be detected generated from the sample 20 in accordance with the irradiation of the electron beams 21, and a correction coil 4 for correcting the deflection of the electron beams 21 generated by the electric field is arranged at a lower part of the electron detect unit 7. COPYRIGHT: (C)2010,JPO&INPIT |
