| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for removing a silicon-containing film, conventionally removable only by dry stripping, by a stripping process with a stripping solution (wet stripping). SOLUTION: This method of stripping a coated-type silicon-containing film for stripping and removing the coated-type silicon-containing film obtained by applying a silicon-containing film material used in a lithography, onto a substrate, includes at least a first process for treating the silicon-containing film with an acidic stripping solution containing sulfate ions and/or fluorine ions, and a second process for treating the silicon-containing film with an alkaline stripping solution containing a nitrogen compound. COPYRIGHT: (C)2010,JPO&INPIT |
