METHOD FOR MANUFACTURING SPUTTERING TARGET FOR EL ELEMENT MANUFACTURE, SPUTTERING TARGET FOR EL ELEMENT MANUFACTURE, EL ELEMENT, AND METHOD FOR MANUFACTURING EL ELEMENT

摘要

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a sputtering target for EL element manufacture, which can sufficiently reduce an O content in a light-emitting film. Ž<P>SOLUTION: The method for manufacturing a sputtering target for EL element manufacture includes: a mixing step of obtaining a mixture by mixing at least bivalent-metal sulfide, trivalent metal, and sulfide of a light-emitting center element; a formation step of obtaining moldings by molding the mixture; and a sintering step of obtaining the sputtering target for EL element manufacture by sintering the moldings. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž