发明名称 |
METHOD FOR FORMING FINE PATTERN OF POLYMER THIN FILM |
摘要 |
Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.
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申请公布号 |
US2010159139(A1) |
申请公布日期 |
2010.06.24 |
申请号 |
US20090542188 |
申请日期 |
2009.08.17 |
申请人 |
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
发明人 |
KIM SEONG HYUN;LIM SANG CHUL;YANG YONG SUK;KIM ZIN SIG;YOUN DOO HYEB |
分类号 |
B05D1/36 |
主分类号 |
B05D1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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