| 摘要 |
PROBLEM TO BE SOLVED: To provide vacuum processing equipment, wherein abnormality, malfunction and a fault are restored in a short time to suppress a decrease in an operating rate. SOLUTION: The vacuum processing equipment for processing a sample such as a semiconductor wafer disposed inside a processing chamber of a vacuum container in the processing chamber, includes a plurality of control units which each include a plurality of apparatuses to be controlled and an input/output substrate connected to at least one of the apparatuses, and have a plurality of connector units connected to other control units to transmit and receive signals for control to and from them to be connected in a daisy chain, a control unit on a root side or a controller having a means of storing operation records of a control unit on a terminal side. COPYRIGHT: (C)2010,JPO&INPIT
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