| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a hydrophobic substrate by using general purpose organosiloxane in a simple manufacture process without needing a reduced pressure process. Ž<P>SOLUTION: The method of manufacturing the hydrophobic substrate is carried out by using an ultraviolet irradiation apparatus having a light source of ultraviolet ray and a closable irradiation chamber in which a material to be irradiated is arranged, arranging an optional container, in which the substrate as the material to be irradiated in the closable irradiation chamber of the ultraviolet irradiation apparatus and the organosiloxane having a siloxane skeleton in which hydrogen atom or a 1-3C alkyl is directly bonded with a silicon atom, and irradiating the material to be irradiated with the ultraviolet ray to impart hydrophobicity to the substrate. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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