发明名称 Gas Dispersion Shield Method
摘要 A gas dispersion shield and method for protecting the bottom surface of a gas deposition chamber, while injecting gas from a gas insertion channel into the chamber at a non-vertical angle. The gas dispersion shield includes a cylindrically shaped vertical sidewall, an annular flange extending horizontally and outwardly from the sidewall upper end, and a horizontal wall that extends inwardly from the sidewall lower end. The flange includes a top surface, a bottom surface, and a plurality of holes formed through the flange each extending in a non-vertical direction from the bottom surface to the top surface. The bottom surface includes an annular protrusion that fits at least partially into the gas insertion channel, to ensure the gas flows through the non-vertical holes instead of escaping around the flange.
申请公布号 US2010159133(A1) 申请公布日期 2010.06.24
申请号 US20100717828 申请日期 2010.03.04
申请人 CLARK RANDALL 发明人 CLARK RANDALL
分类号 C23C16/44 主分类号 C23C16/44
代理机构 代理人
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