| 摘要 |
An exposure apparatus is equipped with a coarse movement stage (WCS1) which can move along an XY plane and includes a first section and a second section that can come close to and separate from each other, a fine movement stage (WFS1) which holds wafer (W) and is supported relatively movable at least within the XY plane by the coarse movement stage (WCS1), and a drive system which drives the fine movement stage (WFS1) supported by the coarse movement stage (WCS1) independently or integrally with the coarse movement stage (WCS1). Further, the exposure apparatus is equipped with a relay stage (DRST) which can deliver the fine movement stage (WFS1) to/from the coarse movement stage (WCS1). |
