DETERMINING MANUFACTURABILITY OF LITHOGRAPHIC MASK BY REDUCING TARGET EDGE PAIRS USED IN DETERMINING A MANUFACTURING PENALTY OF THE LITHOGRAPHIC MASK

摘要

PURPOSE: A method for determining the manufacturability of a lithographic mask due to reduction of target-edge pairs, which decide the manufacture penalty of a lithographic mask, is provided to reduce the number of selected target-edge pairs in order to reduce computational volume. CONSTITUTION: A plurality of target-edge pairs is selected from the mask layout data of a lithographic mask which includes a first polygon(502A) and a second polygon(502B). The number of target-edge pairs is reduced in order to reduce computational volume. The manufacturability of the lithographic mask, which determines a manufacture penalty, is determined. The manufacturability of the lithography mask is output.