发明名称 ILLUMINATING OPTICAL APPARATUS, AND EXPOSURE METHOD AND APPARATUS
摘要 Provided is an illumination optical apparatus which constantly controls a plurality of polarization statuses at high accuracy. An illuminating optical apparatus (ILS) illuminates a pattern surface of a mask (M) with illuminating light. The illuminating optical apparatus is provided with a polarization optical system, which is arranged in the optical path of the illuminating light, and includes a 1/2 wavelength plate (5), which varies the polarization status of the illuminating light to a linear polarization status having the polarization direction in a prescribed direction and a PBS (4); and a depolarizer (6) which is arranged on a side closer to the mask (M) than the polarization optical system, and varies the polarization state of the illuminating light outputted from the polarization optical system.
申请公布号 EP2200070(A1) 申请公布日期 2010.06.23
申请号 EP20080837855 申请日期 2008.10.07
申请人 NIKON CORPORATION 发明人 TANAKA, HIROHISA
分类号 H01L21/00;G03F7/20 主分类号 H01L21/00
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