| 摘要 |
An exposure apparatus (EX) for exposing a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a controller (CONT) for controlling a velocity of movement of a substrate stage (PST) depending on a distance between a first position and a second position when the substrate stage is moved substantially linearly from the first position to the second position in a state in which a liquid immersion area is locally formed on the substrate stage. A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy. |
