发明名称 Electrical fuses and resistors having sublithographic dimensions
摘要 Electrical fuses and resistors having a sublithographic lateral or vertical dimension are provided. A conductive structure comprising a conductor or a semiconductor is formed on a semiconductor substrate. At least one insulator layer is formed on the conductive structure. A recessed area is formed in the at least one insulator layer. Self-assembling block copolymers are applied into the recessed area and annealed to form a first set of polymer blocks and a second set of polymer blocks. The first set of polymer blocks are etched selective to the second set and the at least one insulator layer. Features having sublithographic dimensions are formed in the at least one insulator layer and/or the conductive structure. Various semiconductor structures having sublithographic dimensions are formed including electrical fuses and resistors.
申请公布号 US7741721(B2) 申请公布日期 2010.06.22
申请号 US20070831236 申请日期 2007.07.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BLACK CHARLES T.;COLBURN MATTHEW E.;DALTON TIMOTHY J.;EDELSTEIN DANIEL C.;LI WAI-KIN;STAMPER ANTHONY K.;YANG HAINING S.
分类号 H01L23/52 主分类号 H01L23/52
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