发明名称 Nonvolatile memory cells employing a transition metal oxide layers as a data storage material layer and methods of manufacturing the same
摘要 Non-volatile memory cells employing a transition metal oxide layer as a data storage material layer are provided. The non-volatile memory cells include a lower and upper electrodes overlapped with each other. A transition metal oxide layer pattern is provided between the lower and upper electrodes. The transition metal oxide layer pattern is represented by a chemical formula MxOy. In the chemical formula, the characters “M”, “O”, “x” and “y” indicate transition metal, oxygen, a transitional metal composition and an oxygen composition, respectively. The transition metal oxide layer pattern has excessive transition metal content in comparison to a stabilized transition metal oxide layer pattern. Methods of fabricating the non-volatile memory cells are also provided.
申请公布号 US7741669(B2) 申请公布日期 2010.06.22
申请号 US20080200190 申请日期 2008.08.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAEK IN-GYU;LEE MOON-SOOK
分类号 H01L27/108;H01L29/76 主分类号 H01L27/108
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