APPRATUS FOR TREATMENTING SUBSTRATE

摘要

PURPOSE: An apparatus for processing a substrate is provided to prevent the diffusion of an internal gas generated from a rotation sealing member to a reaction chamber. CONSTITUTION: A chamber(112) offers a reaction space. A substrate mounting unit(120) is located in the reaction space and the substrate(114) is placed therein. A supporting unit supports and rotates the substrate mounting unit. A rotation seal member is arranged in lower part of the chamber and is connected to the supports. When the support stand revolves, the airtight of the reaction space is kept. An interrupter(220) prevents the diffusion of the gas generating in the inside of the rotation sealing member to the reaction space.