SUBSTRATE ECHING APPARATUS AND METHOD USING THE SAME

摘要

PURPOSE: A substrate etching apparatus and a method using the same are provided to etch a substrate through a non-contact method while being stood. CONSTITUTION: A loading part(110) loads a substrate in a standing state. An etching part(120) forms a predetermined pattern by using an etchant while keeping the substrate standing. A drying part(140) dries the surface while a transferred substrate from the etching part standing. An unloader(150) unloads the substrate transferred to from the dryer part. A transfer unit(160) transfers the substrate with being stood.