发明名称 Method for the structured application of a laminatable film to a substrate for a semiconductor module
摘要 A method for structured application of a laminatable intermediate layer (9) to a substrate (1) for a semiconductor module, wherein a separating layer is indirectly or directly applied to the substrate (1) over a large surface, the intermediate layer (9) is applied to the substrate (1), including the separating layer(s), by lamination, over a large surface, the intermediate layer (9) is opened in places on the substrate (1), where recesses are provided for the intermediate layer (9), and the separating layer (8) is removed in these places.
申请公布号 US7742843(B2) 申请公布日期 2010.06.22
申请号 US20060548873 申请日期 2006.10.12
申请人 INFINEON TECHNOLOGIES AG 发明人 LICHT THOMAS;KEMPER ALFRED
分类号 G05D23/00;H01L21/48;H01L23/00;H01L23/053;H01L23/12;H01L23/31;H01L23/495;H01L23/538;H05K3/00;H05K3/28 主分类号 G05D23/00
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