| 摘要 |
A semiconductor memory device includes: first and second wiring layers extending in substantially parallel to each other in a first direction; a first semiconductor region formed in a part of a portion between the first and second wiring layers; a second semiconductor region formed on an opposite side to the first semiconductor region with respect to the second wiring layer and making a pair with the first semiconductor region; a third semiconductor region formed in another part of the portion between the first and second wiring layers; a fourth semiconductor region formed on an opposite side to the third semiconductor region with respect to the first wiring layer and making a pair with the third semiconductor region; a third wiring layer extending in a second direction that crosses the first direction and having an electrical contact with the first semiconductor region; a fourth wiring layer extending in the second direction and having an electrical contact with the fourth semiconductor region; a fifth wiring layer extending in the first direction to cross over the first and third semiconductor regions.
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