发明名称 Dielectric film capacitor and method of manufacturing the same
摘要 A dielectric film capacitor includes a lower electrode having an opening and formed of a material including platinum, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film. The planar area of the lower electrode is 50% or more of the area of a formation region of the dielectric film. A dielectric film capacitor includes a lower electrode formed of a material including platinum and having a thickness of 10 to 100 nm, a dielectric film provided over the lower electrode and including an oxide having an ABOx crystal structure, and an upper electrode provided over the dielectric film.
申请公布号 US7742277(B2) 申请公布日期 2010.06.22
申请号 US20060508204 申请日期 2006.08.23
申请人 IBIDEN COMPANY LIMITED 发明人 SHINODA TOMOTAKA;YAMADA KINJI;KITANO TAKAHIRO;YAMANISHI YOSHIKI;HARADA MUNEO;KAWAGUCHI TATSUZO;HIROTA YOSHIHIRO;OKUMURA KATSUYA;KAWANO SHUICHI
分类号 H01G4/06;H01G4/005 主分类号 H01G4/06
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