发明名称 IMPRINT APPARATUS
摘要 PURPOSE: An imprint apparatus are provided to solve a problem of external structure by including a curing unit built in a chamber part. CONSTITUTION: A chamber part(2) offers a chamber(S) of a constant size. A stamp(4) includes imprint surface(K1) compartmentalizing a etching region and non-etching is arranged in the substrate. A stage(6) has a loading plane for loading a substrate and is arranged in lower part of the stamp. A driving part(8) drives stamp or the stage up and down.
申请公布号 KR20100067924(A) 申请公布日期 2010.06.22
申请号 KR20080126524 申请日期 2008.12.12
申请人 DMS CO., LTD. 发明人 PARK, CHUN SEONG;LEE, JIN HYANG
分类号 H01L21/027;G03F7/00 主分类号 H01L21/027
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