| 摘要 |
PURPOSE: A film deposition apparatus, film deposition method, and computer-readable storage medium are provided to suppress the interference due to heating. CONSTITUTION: A rotary table(2) is installed within a vacuum container(1) and has a substrate mounting region loading a substrate. A substrate heating unit(7) heats the substrate loaded in the rotary table. A first and second reaction gas supply unit which are separated from the peripheral direction of the rotary table supply a first and second gas to the substrate mounting region. An exhaust pipe(61) exhausts each reaction gas and the dissociation gas provided to the rotary table. Temperature controllers(82a, 82b) heats and cools down vacuum vessel.
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