发明名称 MOUNTING TABLE STRUCTURE, AND TREATING APPARATUS
摘要 Provided is a mounting table structure, which can prevent a high thermal stress from occurring in a mounting table thereby to prevent the mounting table itself from breaking and which can suppress the feed of a corrosion-preventing purge gas. The mounting table structure (54) is disposed in a treating container (22) of a treating apparatus (20), for mounting a treating object (W). The mounting table structure (54) comprises a mounting table (58) having heating means (64) and made of a dielectric material, and a cylindrical post (56) made of a dielectric material and extending upward from the bottom side of the treating container, for supporting the mounting table (58) removably. To the lower face of the mounting table (58), there are jointed cylindrical protecting tubes (60), which have a diameter smaller than that of the post and which are made of a dielectric material. Into the protecting tubes (60), there are inserted functional rod members (62), which reach the mounting table (58) at their upper ends.
申请公布号 KR20100067654(A) 申请公布日期 2010.06.21
申请号 KR20107006505 申请日期 2008.08.25
申请人 TOKYO ELECTRON LIMITED 发明人 TANAKA SUMI;KAWASAKI HIROO
分类号 H01L21/683;H01L21/205;H01L21/3065 主分类号 H01L21/683
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