发明名称 DEVICE WITH ABRUPT METAL-INSULATOR JUCTION WITH PARALLEL CONDUCTING LAYERS
摘要 FIELD: physics, semiconductors. ^ SUBSTANCE: invention relates to a device with an abrupt metal-insulator junction with parallel conducting layers. The device with an abrupt metal-insulator junction has at least one conducting layer whose thickness enables transformation of the entire region of the conducting layer into a metal layer as a result of the metal-insulator junction, a first electrode in a certain region of the substrate and a second electrode lying at a given distance from the first electrode, where the conducting layer connects the first and the second electrode. Current flows uniformly to the entire region of the conducting layer. ^ EFFECT: damage to the conducting layer usually caused by current flowing through that conducting layer is less probable owing to the configuration of the device. ^ 16 cl, 10 dwg
申请公布号 RU2392692(C2) 申请公布日期 2010.06.20
申请号 RU20080131700 申请日期 2007.01.31
申请人 EHLEKTRONIKS EHND TELEKOMM'JUNIKEJSHNZ RISERCH INSTIT'JUT 发明人 KIM KHIUN-TAK;CHAE BIUNG-GIU;KANG KVANG-JONG;KIM BONG-DZUN;LI JONG-VUK;JUN SUN-DZIN
分类号 H01L29/768 主分类号 H01L29/768
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