EQUIPMENT FOR CLEANING WAFER OF SCAN TYPE AND CLEAN METHOD AT THE SAME

摘要

PURPOSE: Cleaning equipment and a cleaning method thereof are provided to prevent a defect in a scan tail by eliminating an uneven absorption pressure difference which is caused by the step difference between mount plates that support a wafer. CONSTITUTION: An input module(20) inserts a wafer(10) as a sheet in a first location. An output module(30) discharges the wafer in a second position. A movable module transfers the wafer. A cleaning module(40) comprises an upper cleaning module and a lower cleaning module. The cleaning module is divided into a plurality of cells, each of which operates individually.