INDIUM OXIDE TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a transparent conductive film which is formed as an amorphous film by using a sputtering target which comprises an oxide sintered body containing barium in addition to indium oxide and tin. This transparent conductive film is characterized by containing barium in addition to indium oxide and tin, and is also characterized in that the molar ratio y of tin relative to 1 mole of indium is less than the value (-2.9 x 10Ln(x)-6.7 x 10) which is expressed by using the molar ratio x of barium relative to 1 mole of indium, and the crystallization temperature by annealing is not less than 100°C.