APPARATUS FOR TREATMENT OF PLURAL SUBSTRATES

摘要

PURPOSE: An apparatus for treating a plurality of substrates is provided to improve operational efficiency by configuring a shower head with a spray segment which satisfies a uniform deposition condition. CONSTITUTION: A process space is prepared in a chamber(110). A substrate support(120) is installed inside of the chamber. The substrate support includes a substrate loading part(121) on which a plurality of substrates(W) is loaded. A shower head(130) is installed on the upper side of the substrate support in the chamber. The shower head includes a gas spray part(131) for spraying process gas towards the substrates. The shower head deposits a thin film on the substrate with a uniform thickness.