| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polymer compound available as a base component and an additive of a positive resist composition, and to provide a compound useful as a monomer of the polymer compound, and a positive resist composition containing the polymer compound, and a resist pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition contains a base component (A) the solubility of which with an alkali developing solution is increased by an action of an acid, and an acid generator component (B) that generates an acid upon exposure. The base component (A) includes a (meth)acrylate unit in a side chain, the unit having a divalent aliphatic hydrocarbon group having a substituent, in which a carbon atom having an ester group as a base-dissociable group that dissociates by an action of an alkali developing solution is a tertiary carbon atom. <P>COPYRIGHT: (C)2010,JPO&INPIT |
