发明名称 PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF DEPOSITION-INHIBITORY MEMBER
摘要 A plasma processing apparatus of the present invention performs on a substrate to be processed, plasma processing with a noble metal material and a ferroelectric material and is provided with a constituent member that is exposed to plasma while being heated. The constituent member is formed with an aluminum alloy of at least 99% aluminum purity.
申请公布号 US2010151150(A1) 申请公布日期 2010.06.17
申请号 US20080600650 申请日期 2008.05.14
申请人 ULVAC, INC. 发明人 KOKAZE YUTAKA;UEDA MASAHISA;ENDOU MITSUHIRO;SUU KOUKOU;MIYAZAKI TOSHIYA;SAKATA GENJI;NAKAMURA TOSHIYUKI
分类号 C23C16/513 主分类号 C23C16/513
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