<p>An apparatus for dispensing fluid during semiconductor substrate processing operations comprises an enclosure having a first side and a second side. The enclosure comprises a first processing station and a second processing station. The second processing station is positioned adjacent to the first processing station. In addition, the substrate processing apparatus includes a first dispense arm configured to deliver a fluid to the first processing station wherein the first dispense arm is positioned between the first side and the first processing station and a second dispense arm configured to deliver the fluid to the second processing station wherein the second dispense arm is positioned between the second side and the second processing station. The substrate processing apparatus also comprises a first rinse arm configured to deliver a rinsing fluid to the first processing station and a second rinse arm configured to deliver the rinsing fluid to the second processing station.</p>
申请公布号
WO2010068597(A1)
申请公布日期
2010.06.17
申请号
WO2009US67038
申请日期
2009.12.07
申请人
SOKUDO CO., LTD.;BRITCHER, ERIC B.;RABINOVICH, YEVGENIY;SHERMAN, SVETLANA;OTANI, MASAMI
发明人
BRITCHER, ERIC B.;RABINOVICH, YEVGENIY;SHERMAN, SVETLANA;OTANI, MASAMI