| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaluation substrate to evaluate a position shift due to an electric field at respective positions formed, inside a lithographic apparatus. <P>SOLUTION: The evaluation substrate 10 of a charged particle beam is equipped with: a substrate body 12; a conductive membrane 28 formed on the substrate body 12; a plurality of charged parts 22, arranged regularly in a region of the substrate body 12 face; and a plurality of marks 24, arranged at the surrounding of respective charged parts 22 on the conductive membrane 28. The position shift due to the electric field at respective positions formed in the lithographic apparatus can be evaluated. <P>COPYRIGHT: (C)2010,JPO&INPIT |
