发明名称 Multi-cell Masks and Methods and Apparatus for Using Such Masks To Form Three-Dimensional Structures
摘要 Multilayer structures are electrochemically fabricated via depositions of one or more materials in a plurality of overlaying and adhered layers. Selectivity of deposition is obtained via a multi-cell controllable mask. Alternatively, net selective deposition is obtained via a blanket deposition and a selective removal of material via a multi-cell mask. Individual cells of the mask may contain electrodes comprising depositable material or electrodes capable of receiving etched material from a substrate. Alternatively, individual cells may include passages that allow or inhibit ion flow between a substrate and an external electrode and that include electrodes or other control elements that can be used to selectively allow or inhibit ion flow and thus inhibit significant deposition or etching. Single cell masks having a cell size that is smaller or equal to the desired deposition resolution may also be used to form structures.
申请公布号 US2010147695(A1) 申请公布日期 2010.06.17
申请号 US20100684794 申请日期 2010.01.08
申请人 UNIVERSITY OF SOUTHERN CALIFORNIA 发明人 COHEN ADAM L.
分类号 C25D5/00;C25D1/08;C25D5/02;C25D5/10;C25D7/12;C25D17/00 主分类号 C25D5/00
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