发明名称 EXPOSURE HEAD AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To rationally arrange overlapping elements in an exposure head mounted with a plurality of light emitting element arrays. <P>SOLUTION: The light emitting element arrays each formed with the predetermined number of light emitting elements are arranged at predetermined spaces to constitute an array row. Further, a plurality of light emitting element array rows are arranged in a second direction intersecting a direction (a first direction) of the array row, and the array rows are arranged shifted so that clearances between the light emitting element arrays are closed with the other light emitting element arrays and that the overlapping elements at the ends of the light emitting element arrays overlap with the overlapping elements at the ends of the light emitting element arrays constituting the other array row when viewed from the second direction. The light emitting element array more distant in the second direction is set to increase the number of overlapping elements. Since the influence of the inclination of the exposure head becomes stronger as the distance between the light emitting element arrays becomes farther, the overlapping elements can be rationally arranged in this manner. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010131803(A) 申请公布日期 2010.06.17
申请号 JP20080308262 申请日期 2008.12.03
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI KENJI;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;G03G15/04;H04N1/036 主分类号 B41J2/44
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