NANO-IMPRINT LITHOGRAPHY PROCESS

摘要

PURPOSE: A nano-imprint lithography process is provided to remove an error of patterns on a substrate by using a mod having smaller size than a substrate area. CONSTITUTION: In a nano-imprint lithography process, after forming a first resin pattern, resin coated on a part of multiple area on an etch layer is etched by using the first resin pattern as a mask(110). After forming a second resin pattern, resin coated on the other part of multiple area on an etch layer is etched by using the second resin pattern as a mask(120).