| 发明名称 |
LITHOGRAPHY APPARATUS AND METHOD FOR FABRICATING DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which space between a substrate and a projection system is filled with liquid while minimizing the quantity of the liquid required to be accelerated during a stage operation. <P>SOLUTION: In the lithography projection apparatus, space between a final element of the projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a plane of the substrate and the liquid is confined in the space. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010135857(A) |
申请公布日期 |
2010.06.17 |
| 申请号 |
JP20100059726 |
申请日期 |
2010.03.16 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
LOF JOERI;ANTONIUS THEODORUS ANNA MARIA DERKSEN;HOOGENDAM CHRISTIAAN ALEXANDER;KOLESNYCHENKO ALEKSEY;LOOPSTRA ERIK ROELOF;MODDERMAN THEODORUS MARINUS;MULKENS JOHANNES CATHARINUS HUBERTUS;RITSEMA ROELOF AEILKO SIEBRAND;SIMON KLAUS;DE SMIT JOHANNES THEODOOR;STRAAIJER ALEXANDER;STREEFKERK BOB;VAN SANTEN HELMAR |
| 分类号 |
H01L21/027;G03F7/20;G03F9/00 |
主分类号 |
H01L21/027 |
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