| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and method used for detecting parameters for exposure portions or exposure beams. <P>SOLUTION: A system 200 comprises a substrate stage 106 and a metering stage 116. The substrate stage 106 positions a substrate 112 to receive exposure beams from an exposure portion of the lithography system 200. A metering system comprises an exposure system or a sensor system for detecting parameters of the exposure beams. For example, the system is within the lithography system, and the lithography system includes a lighting system 212, a patterning device 214, and a photographing system 216. The patterning device 214 forms patterns in radiation beams from the lighting system 212. A projection system 216 disposed in the exposure portion projects patterned beams onto the substrate 112 or the sensor system. <P>COPYRIGHT: (C)2010,JPO&INPIT |
