| 摘要 |
<p>PURPOSE: A method for manufacturing an image sensor is provided to maintain micro-lenses at certain interval by coating a photo-resist pattern and exposing the patterns in an exposure process. CONSTITUTION: A color filter layer(140) and a planarization layer(150) are formed on a substrate. A first photo resist pattern is formed on the planarization layer. A second photoresist for the micro-lens is formed on the first photo resist pattern. An exposure process is progressed, and the first photo resist pattern is removed. The second photoresist pattern which is patterned in the exposure process is processed by a thermal process and then, the micro lens is formed.</p> |
