| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus reducing latent adverse effect of liquid drops remained on a substrate table after light-exposure of a substrate. <P>SOLUTION: The lithographic apparatus having a table including a target and/or a sensor and a liquid displacement device displacing a liquid from the target and/or the sensor using a localized gas flow is disclosed. The liquid displacement device can be disposed at various positions. For example, the liquid displacement device can be mounted on a liquid handling device at a light-exposure station and can be disposed adjacent to a transfer passage between the light-exposure station and a measuring station or adjacent to a load/unload station or the sensor in the transfer passage. <P>COPYRIGHT: (C)2010,JPO&INPIT |
