| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of preventing the re-adhesion of contaminant and the like and improving a cleaning treatment effect. SOLUTION: The treatment apparatus includes a treatment tank where each substrate to be treated is erected and stored in a clearance between a pair of confronted first and second erection walls erected by leaving a prescribed interval, a treatment liquid is supplied and the surface treatment of the substrate to be treated is performed. In the first and second erection walls 2b and 3, a first fluid control means is arranged on an inner wall face of either confronted wall. The first fluid control means is formed of dimples a<SB>1</SB>to a<SB>n</SB>changing a flow of the treatment liquid between an inner wall face side where the fluid control means is arranged and a substrate face side of the substrate W to be treated. COPYRIGHT: (C)2010,JPO&INPIT |
