发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a pattern exhibiting sufficient resolution and having high transmittance. <P>SOLUTION: The photosensitive composition contains a binder resin (A), at least one kind of compound (B) selected from a group consisting of carboxylic acid anhydrides and compounds having at least two carboxyl groups, a photopolymerizable compound (C), and a photopolymerization initiator (D), wherein the binder resin (A) is prepared by polymerizing at least an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride (A-a) and a monomer (A-b) copolymerizable with (A-a) and/or a monomer (A-c) having a 2C-4C cyclic ether structure. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010134444(A) 申请公布日期 2010.06.17
申请号 JP20090245257 申请日期 2009.10.26
申请人 SUMITOMO CHEMICAL CO LTD 发明人 INOUE KATSUJI
分类号 G03F7/033;C08G59/32;G02F1/1339;G03F7/004 主分类号 G03F7/033
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