| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which can reduce a liquid remaining on a substrate or a substrate stage. <P>SOLUTION: The exposure apparatus includes a projection optical system PL for projecting light from a mask M, and the substrate stage PST for holding and moving the substrate P. The exposure apparatus EX exposes the substrate P through: the liquid 2 filled in a clearance between a final plane of the projection optical system PL and the substrate P held on the substrate stage PST; the projection optical system PL; and the mask M. The exposure apparatus includes: a supply nozzle 12 for supplying the liquid 2 in the clearance; a recovery nozzle 13 for recovering the liquid 2 from the clearance; a sensor 7 arranged on an outer side of the recovery nozzle 13 and detecting the liquid 2; and a control device MAIND for controlling movement of the substrate stage PST, and setting movement parameter of the substrate stage PST based on an output of the sensor 7. <P>COPYRIGHT: (C)2010,JPO&INPIT |
