发明名称 ELECTROLESS NICKEL PLATING BATH AND METHOD FOR ELECTROLESS NICKEL PLATING
摘要 PROBLEM TO BE SOLVED: To provide an electroless nickel plating bath not containing harmful metal species. SOLUTION: In the electroless nickel plating bath, there are contained at least an iron ion source and an iodide ion source. With the use of the electroless nickel plating bath containing at least the iron ion source and the iodide ion source, it is possible to suppress decomposition of the plating bath without using harmful metal species to stabilize the plating bath. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010132949(A) 申请公布日期 2010.06.17
申请号 JP20080308536 申请日期 2008.12.03
申请人 C UYEMURA & CO LTD 发明人 INAGAWA HIROSHI;HASHIMOTO DAISUKE;ISHIMARU SHINJI;KISO MASAYUKI
分类号 C23C18/34 主分类号 C23C18/34
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