CARRIER HEAD MEMBRANE ROUGHNESS TO CONTROL POLISHING RATE
摘要
An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
申请公布号
WO2010068691(A2)
申请公布日期
2010.06.17
申请号
WO2009US67376
申请日期
2009.12.09
申请人
APPLIED MATERIALS, INC.;PAIK, YOUNG J.;BHATNAGAR, ASHISH;NARENDRNATH, KADTHALA RAMAYA
发明人
PAIK, YOUNG J.;BHATNAGAR, ASHISH;NARENDRNATH, KADTHALA RAMAYA