| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus for consecutively changing and adjusting an image focus location of a projection optical system with high precision. <P>SOLUTION: First and second optical members (32, 33) composed of a wedge-shaped glass plate with inclined planes (32b, 33a) are placed opposite to each other. On the inclined plane (32b) of the first optical member (32), a positive pressure groove (33c) to which a compressed air is supplied from a positive pressure source (P) and a negative pressure groove (33d) vacuum-sucked by a negative pressure source (V) are provided to constitute an air bearing, and the first and second optical members (32, 33) are opposed to each other without contact. By driving an actuator (35) against a biasing force of a coil spring (36) to relatively displace the first optical member (32) relative to the second optical member (33), a relative distance (plate thickness) between a light entrance face (32a) and a light exit face (33b) can be changed and adjusted. By providing such an image focus location adjusting apparatus (31) on an optical axis of a projection optical system, the image focus location can be arbitrarily changed and adjusted. <P>COPYRIGHT: (C)2010,JPO&INPIT |
