发明名称 ELECTRODE MEMBER AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an electrode member capable of correctly controlling a temperature in a chamber, and a substrate treatment apparatus including the same. SOLUTION: The electrode member for generating plasma includes: an electrode plate; and a cooling unit having a plurality of thermoelectric modules (10) thermally contacting with the electrode plate. The electrode plate has a front surface opposing a generating space for generating plasma and a back surface opposing the front surface, and the thermoelectric modules (10) are arranged on the back surface of the electrode plate. A mounting hole recessed from the back surface is formed at the back surface of the electrode plate, and the thermoelectric modules (10) are mounted to the mounting hole. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010135450(A) 申请公布日期 2010.06.17
申请号 JP20080308091 申请日期 2008.12.03
申请人 ADVANCED DISPLAY PROCESS ENGINEERING CO LTD 发明人 SON HYOUNG-KYU
分类号 H01L21/3065;C23C14/34;C23C14/50;C23C16/46;C23C16/509;H01L21/205;H01L21/683 主分类号 H01L21/3065
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