发明名称 SPUTTERING TARGET FOR FORMING PERPENDICULAR MAGNETIC RECORDING MEDIUM FILM HAVING LOW RELATIVE PERMEABILITY
摘要 <p>Disclosed is a sputtering target for forming a perpendicular magnetic recording medium film, which has a constituent composition composed of 0.5-15% by mole of a nonmagnetic oxide, 4-20% by mole of Cr, 5-25% by mole of Pt and the balance of Co and unavoidable impurities. The sputtering target has a structure wherein a Co-Cr two-component alloy phase, a Pt phase and a nonmagnetic oxide phase are uniformly dispersed.</p>
申请公布号 WO2010067446(A1) 申请公布日期 2010.06.17
申请号 WO2008JP72564 申请日期 2008.12.11
申请人 MITSUBISHI MATERIALS CORPORATION;NONAKA, SOHEI;MISHIMA, AKIFUMI 发明人 NONAKA, SOHEI;MISHIMA, AKIFUMI
分类号 G11B5/851 主分类号 G11B5/851
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